Holey Graphene as a Weed Barrier for Molecules
Matthew L. Gethers, John C. Thomas, Shan Jiang, Nathan O. Weiss, Xiangfeng Duan, William A. Goddard III, Paul S. Weiss
2015ACS Nano, 9(11), 10909-1091536cited
Abstract
We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.
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Cite this publication
Gethers, M. L., Thomas, J. C., Jiang, S., Weiss, N. O., Duan, X., III, W. A. G., & Weiss, P. S. (2015). Holey Graphene as a Weed Barrier for Molecules. *ACS Nano*, *9*(11), 10909-10915. https://doi.org/10.1021/acsnano.5b03936