Damage-Free Atomic-Scale Etching and Surface Enhancements by Electron-Enhanced Reactions: Results and Simulations

S.J. Anz, D.I. Margolese, S.F. Sando, H. P. Gillis, William A. Goddard III

2021In: Computational Materials, Chemistry, and Biochemistry: From Bold Initiatives to the Last Mile ; Springer Series in Materials Science, No. 284; (S. Shankar, R. Muller, T. Dunning and G.H. Chen), Springer, Cham, 2021, pp.603–627.2cited

DOI: 10.1007/978-3-030-18778-1_26

Group Members

William A. Goddard III

Charles and Mary Ferkel Professor

Cite this publication

Anz, S., Margolese, D., Sando, S., Gillis, H. P., & III, W. A. G. (2021). Damage-Free Atomic-Scale Etching and Surface Enhancements by Electron-Enhanced Reactions: Results and Simulations. *In: Computational Materials, Chemistry, and Biochemistry: From Bold Initiatives to the Last Mile ; Springer Series in Materials Science, No. 284; (S. Shankar, R. Muller, T. Dunning and G.H. Chen), Springer, Cham, 2021, pp.603–627.*. https://doi.org/10.1007/978-3-030-18778-1_26