The Role of Oxygen and Other Chemisorbed Species on Surface Processes for Metals and Semiconductors; Approaches to Dynamical Studies of Surface Processes.
William A. Goddard III, J. J. Low, Barry D. Olafson, Antonio Redondo, Yehuda Zeiri, M.L. Steigerwald, Emily A. Carter, J. N. Allison, R. Chang
1985Proceedings of the Symposium on The Chemistry and Physics of Electrocatalysis , p.
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III, W. A. G., Low, J. J., Olafson, B. D., Redondo, A., Zeiri, Y., Steigerwald, M., Carter, E. A., Allison, J. N., & Chang, R. (1985). The Role of Oxygen and Other Chemisorbed Species on Surface Processes for Metals and Semiconductors; Approaches to Dynamical Studies of Surface Processes.. *Proceedings of the Symposium on The Chemistry and Physics of Electrocatalysis , p.*.