Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition.
J.K. Holt, M. Swiatek, D.G. Goodwin, Richard P. Muller, William A. Goddard III, H.A. Atwater
2002Thin Solid Films, 395(1), 29–3538cited
Group Members
Cite this publication
Holt, J., Swiatek, M., Goodwin, D., Muller, R. P., III, W. A. G., & Atwater, H. (2002). Gas phase and surface kinetic processes in polycrystalline silicon hot-wire chemical vapor deposition.. *Thin Solid Films*, *395*(1), 29–35. https://doi.org/10.1016/S0040-6090(01)01202-0